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1 article(s) from Chang, Che-Wei

Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning

Chang-Ming Wang,
Hong-Sheng Chan,
Chia-Li Liao,
Che-Wei Chang and
Wei-Ssu Liao

Beilstein J. Nanotechnol. 2023, 14, 34–44, doi:10.3762/bjnano.14.4

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Scheme 1: Illustration of the gap-directed chemical lift-off lithography process. (A) The selective removal o...

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Figure 1: Visualization of surface patterns created by gap-directed CLL through biorecognition. (A) Schematic...

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Figure 2: Controls over rubber stamp structural parameters for gap-directed CLL and the resulted fluorescent ...

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Figure 3: The transfer of CLL created molecular pattern to the underneath Au layer through wet chemical etchi...

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Figure 4: Gap-directed CLL operated with microscale parallel line shape features (W = 6 μm, D = 6 μm) and the...

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Published 04 Jan 2023

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